LEC participated in the 2013 International Workshop on EUV Lithography

LEC participated in the 2013 International Workshop on EUV Lithography held June 10-14, 2013 in Maui, Hawaii. A highlight of LEC’s presentation was a description of the new facility (ALPS II), which is fully operational.

11.06.2013 by Ben John Newton

Number of comments

This in-house designed LPP source is being used as an engineering test stand to examine the long-term effects (> 8 hours) of source operation.